Effect of substrate temperature on the facing target sputter deposited Ti O2 photoelectrode of dye-sensitized solar cells

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 1012-1017

  Hossain, M F ^a   Biswas, S ^a   Takahashi, T ^a   Kubota, Y ^b   Fujishima, A ^c  

^a UNIVERSITY OF TOYAMA   (Japan)

^b YOKOHAMA CITY UNIVERSITY   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CELLS; CRYSTAL ORIENTATION; DIRECT ENERGY CONVERSION; ELECTRODES; FACINGS; GLASS; LITHOGRAPHY; METALLIZING; MICROSTRUCTURE; MORPHOLOGY; OXIDE MINERALS; PHOTOELECTRICITY; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; REACTIVE SPUTTERING; SOLAR ENERGY; SOLAR EQUIPMENT; SUBSTRATES; TEMPERATURE; TIN; TIN ALLOYS; TITANIUM DIOXIDE; TITANIUM OXIDES;

(1 1 1) ORIENTATION; ANATASE (TIO2); CARBON PASTES; COATED GLASS; COUNTER ELECTRODE (CE); CRYSTALLINITY; DIFFERENT MICROSTRUCTURES; DYE-SENSITIZED SOLAR CELLS (DSSC); FILL FACTOR (FF); LOW COSTS; NANO CRYSTALLINE; OPTICAL MEASUREMENTS; PHOTO ELECTRODES; PHOTO-ELECTRODES; PHOTOELECTRIC CONVERSION EFFICIENCY; ROOM-TEMPERATURE (RT); RUTILE PHASE; SPUTTERING TECHNIQUES; SPUTTERING TEMPERATURE; SUBSTRATE TEMPERATURE (ST);

SOLAR CELLS;

EID: 46449121796     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2834686     Document Type: Article

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