Fabrication of micromechanical structures on substrates selectively etched using a micropatterned ion-implantation method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 175-177, Issue , 2001, Pages 777-781

  Nakano, Shizuka ^a   Nakagawa, Sachiko ^b   Ishikawa, Haruo ^c   Ogiso, Hisato ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OKAYAMA UNIVERSITY OF SCIENCE   (Japan)

^c UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

Etch rate; Ion implantation; Microelectro mechanical systems; Micromachine; Micromachining; Transmission electron microscopy

Indexed keywords

ETCHING; ION IMPLANTATION; MICROMACHINING; MICROSTRUCTURE; POTASSIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ETCHING RATE; MICROPATTERNED ION IMPLANTATION; POTASSIUM HYDROXIDE;

MICROELECTROMECHANICAL DEVICES;

EID: 0035302895     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00605-4     Document Type: Conference Paper

References (5)