메뉴 건너뛰기




Volumn 468, Issue 1-2, 2004, Pages 100-104

Thickness effect of Pb2Ru2O7-x conductive interfacial layers on ferroelectric properties of Pt/Pb(Zr0.35Ti 0.65)O3/Pt capacitors

Author keywords

Ferroelectric properties; Pb2Ru2O7 x (PRO) interfacial layer; PZT; Reactive rf co sputtering

Indexed keywords

ANNEALING; APPROXIMATION THEORY; CAPACITORS; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; FERROELECTRIC MATERIALS; MICROELECTRONICS; MICROSTRUCTURE; PLATINUM; RANDOM ACCESS STORAGE; SURFACE ROUGHNESS;

EID: 4644343768     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.024     Document Type: Article
Times cited : (2)

References (15)
  • 6
    • 0029232269 scopus 로고
    • B.A. Tuttle, S.B. Desu, R. Ramesh, & T. Shiosaki, Ferroelectric Thin Films, Pittsburg, PA: Materials Research Society
    • Chung I.S., Lee J.K., Lee W.I., Chung C.W., Desu S.B. Tuttle B.A., Desu S.B., Ramesh R., Shiosaki T. Ferroelectric Thin Films. Mater. Res. Soc. Symp. Proc. vol. 361:1995;249-254 Materials Research Society, Pittsburg, PA.
    • (1995) Mater. Res. Soc. Symp. Proc. , vol.361 , pp. 249-254
    • Chung, I.S.1    Lee, J.K.2    Lee, W.I.3    Chung, C.W.4    Desu, S.B.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.