Density-functional calculations of self-capacitances of carbon nanostructures

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 346-349

  Nakaoka, N ^a,b   Watanabe, K ^a,b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Ab initio calculations; Capacitance; Carbon nanostructures; Electronic states

Indexed keywords

CAPACITANCE; CARBON; CARRIER CONCENTRATION; COULOMB BLOCKADE; ELECTROCHEMISTRY; ELECTRON TUNNELING; FULLERENES; PROBABILITY DENSITY FUNCTION; SCANNING TUNNELING MICROSCOPY; TUNNEL JUNCTIONS;

AB INITIO CALCULATIONS; CARBON NAOSTRUCTURES; DENSITY OF STATES (DOS); ELECTRONIC STATES;

NANOSTRUCTURED MATERIALS;

EID: 4644342064     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.008     Document Type: Article

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