Structures of sub-monolayered silicon carbide films

Applied Surface Science

Volumn 237, Issue 1-4, 2004, Pages 176-180

  Baba, Y ^a   Sekiguchi, T ^a   Shimoyama, I ^a   Nath, Krishna G ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Ion beam deposition; Near edge X ray absorption fine structure; Polarization dependence; Silicon carbide; Two dimensional layer; X ray photoelectron spectroscopy

Indexed keywords

CARBON; CHEMICAL BONDS; CRYSTAL STRUCTURE; GRAPHITE; ION BEAM ASSISTED DEPOSITION; MONOLAYERS; NANOSTRUCTURED MATERIALS; RESONANCE; SILICON CARBIDE; SYNTHESIS (CHEMICAL);

CARBON ALLOTROPES; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE; POLARIZATION DEPENDENCE; TWO-DIMENSIONAL LAYER;

THIN FILMS;

EID: 4644333844     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.06.092     Document Type: Conference Paper

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