Adsorption of thiophene on a Si(0 0 1)-2 × 1 surface studied by photoelectron spectroscopy and diffraction

Applied Surface Science

Volumn 237, Issue 1-4, 2004, Pages 75-79

  Shimomura, M ^a   Ikejima, Y ^b   Yajima, K ^b   Yagi, T ^b   Goto, T ^b   Gunnella, R ^b,c   Abukawa, T ^b   Fukuda, Y ^a   Kono, S ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c UNIVERSITY OF CAMERINO   (Italy)

Author keywords

Photoelectron diffraction; Photoelectron spectroscopy; Silicon; Surface structure; Thiophene

Indexed keywords

ADSORPTION; ANNEALING; BINDING ENERGY; COMPUTER SIMULATION; DISSOCIATION; ELECTRON DIFFRACTION; HYDROCARBONS; KINETIC ENERGY; OPTIMIZATION; PHOTOELECTRON SPECTROSCOPY; SURFACE STRUCTURE;

LIGHT IRRADIATION; PHOTOELECTRON DIFFRACTION; ROOM TEMPERATURE;

SILICON COMPOUNDS;

EID: 4644307418     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.06.084     Document Type: Conference Paper

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