Detection of unknown localized contamination on silicon wafer surface by sweeping-total reflection X-ray fluorescence analysis

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 59, Issue 8, 2004, Pages 1277-1282

  Mori, Yoshihiro ^a   Uemura, Kenichi ^a   Kohno, Hiroshi ^b   Yamagami, Motoyuki ^b   Yamada, Takashi ^b   Shimizu, Kousuke ^b   Onizuka, Yoshinobu ^b   Iizuka, Yoshinori ^c  

^a Siltronic Japan Corporation   (Japan)

^b Rigaku Industrial Corporation   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Localized contamination; Semiconductor surface analysis; Silicon wafer; Statistics; Total reflection X ray fluorescence (TXRF) analysis

Indexed keywords

CONTAMINATION; FLUORESCENCE; INTEGRATION; MAPPING; SCANNING; X RAY SPECTROMETERS;

LOCALIZED CONTAMINATION; ROUGH MAPPING; SEMICONDUCTOR SURFACE ANALYSIS; TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF) ANALYSIS;

SILICON WAFERS;

EID: 4644282873     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2004.05.022     Document Type: Conference Paper

References (4)

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3. Y. Mori, TXRF for semiconductor application, Adv. X-Ray Anal. 45 (2002) 523-532.
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