Nb/AlOx/Nb junctions fabricated using ECR plasma etching

Physica C: Superconductivity and its Applications

Volumn 412-414, Issue SPEC. ISS., 2004, Pages 1442-1446

  Akaike, H ^a   Kitagawa, Y ^a   Satoh, T ^a   Hinode, K ^a   Nagasawa, S ^a   Hidaka, M ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

Anodization; ECR plasma etching; Nb AlOx Nb; Plasma induced damage

Indexed keywords

ANODIC OXIDATION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CURRENT VOLTAGE CHARACTERISTICS; ELECTRON CYCLOTRON RESONANCE; LITHOGRAPHY; PLASMA ETCHING; RESISTORS; SCANNING ELECTRON MICROSCOPY; SPUTTERING;

ECR PLASMA ETCHING; NB/ALOX/NB; PLASMA INDUCED DAMAGES;

NIOBIUM;

EID: 4644262046     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2004.01.150     Document Type: Conference Paper

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