Characterization of TiO2 and TiO2-HfO2 transparent thin films for microelectronics applications

2006 International Students and Young Scientists Workshop Photonics and Microsystems, ISYSW

Volumn , Issue , 2006, Pages 5-8

  Borkowska, Agnieszka ^a   Domaradzki, Jaroslaw ^a   Kaczmarek, Danuta ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSYSTEMS; OPTICS; SEMICONDUCTOR MATERIALS; STUDENTS;

INTERNATIONAL STUDENTS; TRANSPARENT OXIDE SEMICONDUCTORS;

PHOTONICS;

EID: 46249123976     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/STYSW.2006.343658     Document Type: Conference Paper

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