Ni-based FUSI gates: CMOS integration for 45nm node and beyond

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2006, Pages

  Hoffmann, T ^a   Veloso, A ^a   Lauwers, A ^a   Yu, H ^a   Tigelaar, H ^b   Van Dal, M ^b   Chiarella, T ^a   Kerner, C ^a   Kauerauf, T ^a   Shickova, A ^a   Mitsuhashi, R ^b   Satoru, I ^b   Niwa, M ^b   Rothschild, A ^a   Froment, B ^b   Ramos, J ^a   Nackaerts, A ^a   Rosmeulen, M ^a   Brus, S ^a,b   Vrancken, C ^a   Absil, P P ^a   Jurczak, M ^a   Biesemans, S ^a   Kittl, J A ^b   more..

^a IMEC   (Belgium)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL THEORY; ELECTRON DEVICES; NETWORKS (CIRCUITS); NICKEL; PROCESS ENGINEERING; PRODUCTION CONTROL;

45NM NODE; CMOS CIRCUITS; CMOS INTEGRATION; COMPREHENSIVE EVALUATION; DEVICE DESIGNS; FUSI GATES; MANUFACTURABILITY; RING OSCILLATORS; WORK FUNCTIONS;

PROCESS CONTROL;

EID: 46049115126     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2006.346759     Document Type: Conference Paper

References (21)

1. H.R. Huff et al., IWGI Tech. Dig., p.2, 2001.
2. C. Hobbs et al., VLSI Tech. Dig., p.9, 2003.
3. S.C. Song et al., VLSI Tech. Dig., p. 16, 2006.
4. J. A. Kittl et al., VLSI Tech. Dig., p. 72, 2005.
5. A. Lauwers et al., IEDM Tech. Dig., p.646, 2005.
6. S. Yamaguchi et al., VLSI Tech. Dig., p. 192, 2006.
7. T. Hoffmann et al., VLSI Tech. Dig., p. 194, 2006.
8. M.A. Pawlak et al., Electr. Dev. Lett., 27(2), p.99, 2006.
9. J.A. Kittl et al., Elect. Dev. Lett., 27(1), p.34, 2006.
10. H. Yu et al., IEDM Tech. Dig., p.630, 2005.
11. M. Muller et al., IEDM Tech. Dig., p.626, 2005.
12. S. Yu et al., IEDM Tech. Dig, p.221, 2005.
13. P. Ranade et al., IEDM Tech. Dig., p.217, 2005.
14. S. Kubicek et al., IEDM Tech. Dig., 2006.
15. A. Veloso et al., VLSI Tech. Dig., p.116, 2006.
16. H.S. Jung et al., VLSI Tech. Dig., 2006.
17. Y. Nishida et al., VLSI Tech. Dig., p. 204, 2006.
18. ITRS 2005 Ed. (www.itrs.net/Common/2005ITRS/Home2005.htm).
19. T. Watanabe et al., IEDM Tech Dig., p. 507, 2004.
20. C.H Jan et al, IEDM Tech Dig, 2005.
21. M. Takanayagi et al., IEDM Tech Dig., p. 903, 2005.