Investigation of preparation conditions and microstructure of mn-n films by reactive sputtering

e-Journal of Surface Science and Nanotechnology

Volumn 6, Issue , 2008, Pages 115-118

  Chiba, Masafumi ^a   Naito, Sbinya ^a,b  

^a TOKAI UNIVERSITY   (Japan)

^b Appearance Division Control Department   (Japan)

Author keywords

Magnetic films; Manganese; Nitrides; Polycrystalline thin films; Sputter deposition

Indexed keywords

ARGON; FILM PREPARATION; MAGNETIC FILMS; MANGANESE; MANGANESE COMPOUNDS; NITRIDES; NITROGEN; REACTIVE SPUTTERING; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION;

CHEMICAL COMPOSITIONS; DEPOSITION CONDITIONS; LATTICE SPACING; MANGANESE NITRIDES; NITROGEN FLOW; POLYCRYSTALLINE THIN FILM; PREPARATION CONDITIONS; RF SPUTTERING METHOD;

CRYSTAL STRUCTURE;

EID: 45949088867     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2008.115     Document Type: Article

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