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Volumn 516, Issue 20, 2008, Pages 6767-6770
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Laser fired back contact for silicon solar cells
a
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Author keywords
Contact; Laser; Passivation; PECVD
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Indexed keywords
ALUMINUM;
BORON;
CELLS;
CHEMICAL VAPOR DEPOSITION;
CUBIC BORON NITRIDE;
CURVE FITTING;
DIRECT ENERGY CONVERSION;
FORMING;
LASERS;
MICROFLUIDICS;
NEODYMIUM;
NITRIDES;
NONMETALS;
PASSIVATION;
PHOTOVOLTAIC CELLS;
PULSED LASER APPLICATIONS;
PULSED LASER DEPOSITION;
REFLECTION;
SEMICONDUCTOR DOPING;
SILICON;
SILICON NITRIDE;
SILICON SOLAR CELLS;
SILICON WAFERS;
SOLAR CELLS;
SOLAR ENERGY;
SOLAR EQUIPMENT;
SURFACE DIFFUSION;
SURFACE PROPERTIES;
SURFACES;
(100) SILICON;
BACK CONTACTS;
BACK REFLECTANCE;
BACK SURFACE FIELD (BSF);
BACK-SURFACE RECOMBINATION VELOCITY;
DIFFERENT SUBSTRATES;
DIFFUSION LENGTHS;
DOUBLE LAYER (ELECTRIC);
ELSEVIER (CO);
FITTING PROCEDURES;
HIGH EFFICIENCY;
INDUSTRIAL SOLAR CELLS;
INTERNAL QUANTUM EFFICIENCY (IQE);
INTERNAL REFLECTIONS;
LOW TEMPERATURE (LTR);
ND:YAG PULSED LASER;
PASSIVATION LAYERS;
SI SOLAR CELLS;
SI WAFER;
SPIN ON;
SURFACE PASSIVATION;
SURFACE RECOMBINATION LOSSES;
SURFACE RECOMBINATION VELOCITIES;
AMORPHOUS SILICON;
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EID: 45849150417
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2007.12.079 Document Type: Article |
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Times cited : (23)
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References (10)
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