Applications of TiO 2 film for environmental purification deposited by controlled electron beam-excited plasma

Thin Solid Films

Volumn 386, Issue 2, 2001, Pages 173-176

  Ikezawa, S ^a   Homyara, H ^a   Kubota, T ^a   Suzuki, R ^a   Koh, S ^a   Mutuga, F ^a   Yoshioka, T ^a   Nishiwaki, A ^a   Ninomiya, Y ^a   Takahashi, M ^a   Baba, K ^a   Kida, K ^a   Hara, T ^b   Famakinwa, T ^c  

^a CHUBU UNIVERSITY   (Japan)

^b TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^c NATIONAL TECHNICAL UNIVERSITY OF UKRAINE   (Ukraine)

Author keywords

Electron beam excited plasma (EBEP); NO x dissolution; Optical catalyst; TiO 2 film

Indexed keywords

ELECTRON BEAM-EXCITED PLASMAS (EBEP);

DEPOSITION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRON BEAMS; GLASS; HYDROPHILICITY; NITROGEN OXIDES; PLASMAS; TITANIUM DIOXIDE; ZEOLITES;

OPTICAL FILMS;

EID: 0035874119     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01638-2     Document Type: Article

References (5)