Ion beam lithography for nano-scale pattern features

Materials Research Society Symposium Proceedings

Volumn 1020, Issue , 2007, Pages 39-47

  Baglin, John E E ^a   Kellock, Andrew J ^a   Frommer, Jane E ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BOMBARDMENT; IONS; NANOTECHNOLOGY; PHOTORESISTS; POLYMETHYL METHACRYLATES;

ION BEAM PATTERNING; LIGHT ION IRRADIATION; LITHOGRAPHIC FABRICATION; NANO-SCALE PATTERNS; PHOTORESIST LAYERS; POSITIVE/NEGATIVE; PROXIMITY EFFECTS; SILICON SUBSTRATES;

ION BEAMS;

EID: 45749107469     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1020-gg02-03     Document Type: Conference Paper

References (8)

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