|
Volumn 573-574, Issue , 2008, Pages 35-43
|
Fast diffusion in Germanium and silicon investigated by lamp-based rapid thermal annealing
|
Author keywords
Dissociative mechanism; Kick out mechanism; Self interstitials; Spreading resistance profiling; Tracer diffusion; Vacancies
|
Indexed keywords
DIFFUSION;
ISOTHERMAL ANNEALING;
RAPID THERMAL PROCESSING;
SEMICONDUCTING GERMANIUM;
TEMPERATURE MEASUREMENT;
VACANCIES;
DISSOCIATIVE MECHANISMS;
FAST DIFFUSION;
IMPURITIES IN;
RAPID THERMAL ANNEALING (RTA);
SELF INTERSTITIALS;
SPREADING RESISTANCE PROFILING;
TRACER DIFFUSION;
RAPID THERMAL ANNEALING;
|
EID: 45749086536
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.573-574.35 Document Type: Article |
Times cited : (6)
|
References (21)
|