Diffusion of gold in silicon during rapid thermal annealing: Effectiveness of the surface as a sink for self-interstitials

Journal of Applied Physics

Volumn 83, Issue 3, 1998, Pages 1312-1320

  Lerch, W ^a,b   Stolwijk, N A ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

^b STEAG AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000193277     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366831     Document Type: Article

References (43)

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