Innovative refractive optics for exposure tool illumination

Microlithography World

Volumn 17, Issue 2, 2008, Pages 14-16

  Bizjak, T ^a   Mitra, T ^a   Homburg, O ^a   Hauschild, D ^a   Aschke, L ^a  

^a LIMO Lissotschenko Mikrooptik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MICROFLUIDICS;

EXPOSURE TOOLS; ILLUMINATION SYSTEMS; INTENSITY DISTRIBUTIONS; METROLOGY TOOLS; MICRO-OPTICS; NUMERICAL APERTURES (NA); REFRACTIVE OPTICS;

OPTICS;

EID: 45549106888     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. H.J. Levinson, "Principles of Lithography," SPIE Press, 133, 2001.
2. D.M. Brown, F.M. Dickey, L.S. Weichmann, "Multi-aperture Beam Integration Systems," Laser Beam Shaping, Theory and Techniques, Dickey, F.M., Holswade, S.C. (ed), 2000, pp. 273-311.
3. H. Ganser, M. Darscht, Y. Miklyaev, D. Hauschild, L. Aschke, "High-throughput Homogenizers for hyper-NA Illumination Systems," Proc. SPIE 6154, 61542N1-N11, 2006.
4. T. Bizjak, T. Mitra, L. Aschke, "Novel High-throughput Micro-optical Beam Shapers Reduce the Complexity of Macro-optics in Hyper-NA Illumination Systems," Proc. SPIE 6520,65202X1-X11, 2007.