High-throughput homogenizers for hyper-NA illumination systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Ganser, H ^a   Darscht, M ^a   Miklyaev, Y ^a   Hauschild, D ^a   Aschke, L ^a  

^a LIMO Lissotschenko Mikrooptik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; DIFFRACTIVE OPTICS; LIGHTING; MASKS; REFRACTIVE INDEX; THROUGHPUT;

DIFFRACTIVE ELEMENTS; HIGH-THROUGHPUT HOMOGENIZERS; MONOLITHIC ELEMENTS; ZERO ORDER LOSSES;

MICROOPTICS;

EID: 33745785630     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656402     Document Type: Conference Paper

References (5)

1. Levinson, H. J.: Principles of Lithography, SPIE Press 2001, 133ff
2. W. Hill: Refraktive Mikrooptiken, Laser Technik Journal, Wiley-VCH, Sept. 2005, pp 43-46
3. nd International Symposium on Immersion Lithography, Sept. 2005
4. H. Ganser, L. Aschke, M. Darscht, Y. Miklyaev, D. Hauschild: How Refractive Microoptics Enable Lossless Hyper-NA Illumination Systems for Immersion Lithography; European Mask and Lithography Conference, Dresden, 2006
5. P. Rai-Choudhury: Handbook of Microlithography, Micromachining and Microfabrication. Vol. 1, pp. 71-74