Optimization of measuring conditions for templates of UV nano imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Yoshida, Kouji ^a   Kojima, Kouichirou ^a   Abe, Makoto ^a   Sasaki, Shiho ^a   Kurihara, Masaaki ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

AFM; Metrology; Nano imprint lithography; Scanning probe microscopy; SEM

Indexed keywords

AEROSPACE APPLICATIONS; CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CRACK DETECTION; DATA STORAGE EQUIPMENT; MEASUREMENTS; OPTIMIZATION; PHOTORESISTS; SCANNING; TECHNOLOGY;

(I ,J) CONDITIONS; CRITICAL DIMENSION (CD); FEATURE SIZES; HIGHER RESOLUTION; MASK TECHNOLOGY; MEASUREMENT TOOLS; MEASURING TECHNIQUES; NANO IMPRINT LITHOGRAPHY (NIL); NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; SCANNING PROBE MICROSCOPE (SPM); UV NANO IMPRINT LITHOGRAPHY (UV-NIL);

NANOIMPRINT LITHOGRAPHY;

EID: 45549094306     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793072     Document Type: Conference Paper

References (6)

1. International Technology Roadmap for Semiconductor, 2007 Edition, http://public.itrs.net/
2. K. Yoshida, K. Kojima, M. Abe, S. Sasaki, M. Kurihara, H. Mohri, N. Hayashi, Proceeding of SPIE, vol. 6730, 673050 (2007).
3. T. Hiraka, S. Yusa, A. Fujii, S. Sasaki, K. Itoh, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi, Proceeding of SPIE, vol. 6730, 67305P (2007).
4. C. G. Frace, E. Buhr, K. Dirscherl, Meas. Sci. Technol., vol. 18, pp 510-519 (2007).
5. J. Matsumoto, Y. Ogiso, M. Sekine, T. Iwai, J. Whittey, Proceeding of SPIE, vol. 6349, 634941 (2006).
6. T. Nagai, K. Mesuda, T. Suto, Y. Inazuki, T. Yokoyama, N. Toyama, Y. Morikawa, H. Mohri, N. Hayashi Proceedings of SPIE, vol. 6792, 26 (2008).