A new algorithm for SEM critical dimension measurements for differentiating between lines and spaces in dense line/space patterns without tone dependence

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Matsumoto, J ^a   Ogiso, Y ^a   Sekine, M ^a   Iwai, T ^a   Whittey, J ^b  

^a ADVANTEST CORPORATION   (Japan)

^b Vistec Semiconductor Systems   (United States)

Author keywords

Line and space; Memory; New algorithm; Photomask; SEM critical dimension; Tone reverse

Indexed keywords

CRITICAL DIMENSION (CD); LINE AND SPACE PATTERNS; PHOTOMASKS; TONE REVERSE; TONE SHIFTS;

ALGORITHMS; DATA ACQUISITION; OPTICAL VARIABLES CONTROL; SCANNING ELECTRON MICROSCOPY;

MASKS;

EID: 33846637399     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686143     Document Type: Conference Paper

References (1)

1. L.Reimer "Image Formation in Low-Voltage Scanning Electron Microscopy"