Customized illumination shapes for 193nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Moh, Lung Ling ^a   Gek, Soon Chua ^b   Qunying, Lin ^b   Cho, Jui Tay ^a   Chenggen, Quan ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

Annular illumination; Dipole illumination; Forbidden pitch; Immersion lithography; Off axis illumination; Partial coherent imaging; Resolution enhancement

Indexed keywords

ARCHITECTURAL DESIGN; CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CRACK DETECTION; CURVE FITTING; DATA STORAGE EQUIPMENT; DIFFRACTION; LITHOGRAPHY; MULTITASKING; ONE DIMENSIONAL; PHOTOACOUSTIC EFFECT; SULFATE MINERALS; TECHNOLOGY;

(2+1)-DIMENSIONAL; 193NM IMMERSION LITHOGRAPHY; 45 NM TECHNOLOGY; CRITICAL DIMENSION (CD); CUSTOMIZED ILLUMINATION; ILLUMINATION SETTINGS; IMAGE CONTRASTS; OFF-AXIS-ILLUMINATION (OAI); OPTICAL MICRO LITHOGRAPHY; PERFORMANCE ENHANCEMENTS; PHASE SHIFT MASK (PSM); PROCESS WINDOWS; PUPIL PLANES; RESOLUTION ENHANCEMENT (RET); SIMULATION BASED; SIMULATION RESULTS; SIMULATION STUDIES; THROUGH PITCH;

PHOTORESISTS;

EID: 45449116513     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772441     Document Type: Conference Paper

References (7)

1. Bruce W.Smith, "Forbidden pitch or duty-free: Revealing the causes of across-pitch imaging differences", Proceedings of SPIE Vol. 5040, 2003.
2. Xuelong Shi, Stephen Hsu, Fung Chen, Michael Hsu, Robert J.Socha, Micea Dusa, "Understanding the forbidden pitch phenomenon and assist feature placement, Proceedings of SPIE Vol 4689, 985-996 (2002).
3. Michael S. Yeung, Derek Lee, Robert Lee, A.R. Neureuther, "Extension of Hopkins theory of partially coherent imaging to include thin film interference effects", Proceedings of SPIE Vol. 1927, 452-463 (1993).
4. Joseph W. Goodman, [Introduction to Fourier Optics], McGraw-Hill Inc, Chapter 6 (1996).
5. Alfred K.K. Wong, [Resolution Enhancement Techniques in Optical Lithography], SPIE Publications, 2001.
6. S.Manakli, Y.Trouiller, P.Schiavone, "Optimization of the depth of focus based on the analysis of the diffraction orders in the pupil plane", Microelectronic Engineering, Vol.67-68, 70-77 (2003).
7. James R.Sheats, Bruce W.Smith. [Microlithography Science and Technology], Marcel Dekker Inc, New York, 96-99 (1998).