Latest developments on immersion exposure systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Mulkens, Jan ^a   De Klerk, Jos ^a   Leenders, Martijn ^a   De Jong, Fred ^a   Cromwyk, Jan Willem ^a  

^a ASML   (Netherlands)

Author keywords

CD control; Defects; Double patterning; Exposure systems; Immersion lithography; Overlay

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; FLASH MEMORY; MULTITASKING; NUMERICAL METHODS; OPTICAL SYSTEMS; OPTICS; PAPER; SCANNING; SODIUM; TECHNOLOGY; WELL STIMULATION;

(OTDR) TECHNOLOGY; CD TOLERANCE; DOUBLE PATTERNING; EUV LITHOGRAPHY (EUVL); EVOLUTION (CO); EXPOSURE TOOLS; HEATING CONTROL; IMMERSION EXPOSURE; IMMERSION LITHOGRAPHY (IML); OPTICAL MICRO LITHOGRAPHY; SINGLE EXPOSURE; VOLUME MANUFACTURING; VOLUME PRODUCTIONS;

LITHOGRAPHY;

EID: 45749126096     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774958     Document Type: Conference Paper

References (14)

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13. Jo Finders et.al. "Double patterning for 32-nm and below: an update", Proc SPIE 6924-07 (2008)
14. Bill Arnold et.al. "Towards 3 nm overlay: An integrated error budget for double patterning lithography", Proc. SPIE 6924-03 (2008)