Immersion defect performance and particle control method for 45nm mass production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Chibana, Takahito ^a   Kobayashi, Masamichi ^a   Nakano, Hitoshi ^a   Arakawa, Mikio ^a   Matsuoka, Yoichi ^a   Kawasaki, Youji ^a   Tanabe, Masayuki ^a   Oda, Hirohisa ^a  

^a CANON INC   (Japan)

Author keywords

193 nm immersion lithography; Cleaning; Contamination; Defect; Particle

Indexed keywords

AGRICULTURAL ENGINEERING; COMPUTER NETWORKS; COOLING; DEFECT DENSITY; EVAPORATIVE COOLING SYSTEMS; EXPOSURE METERS; LEACHING; LENSES; LITHOGRAPHY; LOGIC DEVICES; MACHINE TOOLS; MULTITASKING; NOZZLES; NUMERICAL METHODS; OPTICAL INSTRUMENTS; PRODUCTION ENGINEERING; STAGES; TECHNOLOGY; TOOLS; WEIGHT CONTROL;

(OTDR) TECHNOLOGY; CLEANING EFFECTS; CLEANING PROCESSES; DEFECT EVALUATION; DEVICE PRODUCTION; EVAPORATIVE COOLING (EC); EXPOSURE TOOLS; IMMERSION EXPOSURE; IMMERSION NOZZLES; IMMERSION TECHNOLOGY; IN ORDER; IN SITU CLEANING; MASS PRODUCTION; NUMERICAL APERTURE (NA); OPTICAL MICRO LITHOGRAPHY; PARTICLE CONTROL; PROJECTION LENSES; WAFER STAGE; WATER-BASED;

DEFECTS;

EID: 45449102276     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774672     Document Type: Conference Paper

References (6)

1. B. J. Lin, "Semiconductor foundry, lithography, and partners" Proc. SPIE 4688, 11-24 (2002).
2. T. Honda et al., "ArF immersion lithography: critical optical issues" Proc. SPIE 5377, 319-328 (2004).
3. J. H. Burnett and S. Kaplan, "Measurement of the refractive index and thermo-optic coefficient of water near 193 nm" Proc. SPIE 5040, 1742-1749 (2003).
4. H. Nakano et al., "Development of ArF immersion exposure tool " Proc. SPIE 5754, 693-700(2004).
5. M. Kobayashi et al., "Contamination and particle control system in immersion exposure tool" Proc. SPIE 652014 (2006)
6. H. Nakano, SEMI Technology Symposium, p.4-76 (2004)