Development of ArF immersion exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 693-700

  Nakano, Hitoshi ^a   Hata, Hideo ^a   Takahashi, Kazuhiro ^a   Arakawa, Mikio ^a   Chibana, Takahito ^a   Honda, Tokuyuki ^a   Chiba, Keiko ^a   Mori, Sunao ^a  

^a CANON INC   (Japan)

Author keywords

193nm immersion lithography; Contamination; Defect; UPW supply control

Indexed keywords

CONTAMINATION; DEFECTS; ELECTROMAGNETIC WAVE INTERFERENCE; LIGHT SOURCES; PROJECTION SYSTEMS;

CONTAMINATION CONTROL; EXPOSURE SYSTEMS; INTERFERENCE EXPOSURE TOOL; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 25144479867     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600492     Document Type: Conference Paper

References (2)

1. John. H. Burnett, Simon G. Kaplan:, "Measurement of the refractive index and thermo-optic coefficient of water near 193 nm", Optical Microlithography XVI, SPIE vol.5040 (2003)
2. Masaki Yoshida, "Development Status of High Performance Materials for Immersion Lithography", Journal of Photopolymer Science and Technology, vol.17, Number 4(2004)603-608