Development of layout split algorithms and printability evaluation for double patterning technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Chiou, Tsann Bim ^a   Socha, Robert ^b   Chen, Hong ^b   Chen, Luoqi ^b   Hsu, Stephen ^b   Nikolsky, Peter ^c   Van Oosten, Anton ^c   Chen, Alek C ^a  

^a ASML Taiwan Ltd   (Taiwan)

^b ASML US Inc   (United States)

^c ASML   (Netherlands)

Author keywords

Color conflict; Design for manufacturing (DFM); Double patterning technology (DPT); Model based method; Pattern split; Rule based method; Stitching boundary

Indexed keywords

'SPLIT ALGORITHM'; (MIN ,MAX ,+) FUNCTIONS; (OTDR) TECHNOLOGY; (P ,K)-COLORING; BOUNDARY CORRECTION; CHIP LAYOUT; CRITICAL DIMENSION UNIFORMITY (CDU); DOUBLE PATTERNING; ELECTRONIC-DESIGN-AUTOMATION (EDA) TOOLS; IN ORDER; MANIPULATION FUNCTIONS; MASS PRODUCTION; MODEL BASED (OPC); MODEL BASED METHODS; OPTICAL MICRO LITHOGRAPHY; PATTERNING PROCESSES; PROCESS STEPS; PROCESSING SPEEDS; RULE BASED METHODS; TWO LAYERS; WATER-BASED;

ADDITION REACTIONS; ALGORITHMS; ARCHITECTURAL DESIGN; BOOLEAN FUNCTIONS; COLOR; COLORING; COMPUTER AIDED DESIGN; COMPUTER NETWORKS; ELECTRONICS ENGINEERING; ERROR ANALYSIS; EVOLUTIONARY ALGORITHMS; EXTREME ULTRAVIOLET LITHOGRAPHY; FUNCTION EVALUATION; FUNCTIONS; IMAGE RESOLUTION; INDUSTRIAL ENGINEERING; LAWS AND LEGISLATION; LITHOGRAPHY; MATHEMATICAL MODELS; NUMERICAL METHODS; OFFSHORE OIL WELL PRODUCTION; OPTICAL PROPERTIES; PAPER; PRODUCT DEVELOPMENT; SCANNING; SCHEDULING ALGORITHMS; SOLUTIONS; TECHNOLOGY; THROUGHPUT; ULTRAVIOLET DEVICES; WELL STIMULATION;

TITRATION;

EID: 45449093398     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773107     Document Type: Conference Paper

References (9)

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8. R. J. Socha, et. al., "Contact hole reticle optimization by using interference mapping lithography (IML)," SPIE Optical Microlithography XVII, v5377, Santa Clara, USA, 2004.
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