Novel refractive optics enable multipole off-axis illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Bizjak, T ^a   Mitra, T ^a   Hauschild, D ^a   Aschke, L ^a  

^a LIMO Lissotschenko Mikrooptik GmbH   (Germany)

Author keywords

Aberration compensation homogeneity; Adjustable homogeneous radiant intensity; Asymmetric cylindrical lenses; Decentered lenses; Free form surface; Homogenizer; Micro lens array; Modular beam shaping; Tilted illumination

Indexed keywords

CALCIUM; CALCIUM FLUORIDE; COMPUTER NETWORKS; DIFFRACTIVE OPTICS; LENSES; MANUFACTURE; MASKS; MICROOPTICS; NUMERICAL METHODS; OPTICAL DEVICES; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; POLES; SEMICONDUCTOR MATERIALS; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SODIUM; TECHNOLOGY; VARIATIONAL TECHNIQUES;

(I ,J) CONDITIONS; (OTDR) TECHNOLOGY; BEAM SHAPING; CUSTOM DESIGNED; DEEP-ULTRAVIOLET (DUV) REGION; DIFFRACTIVE ELEMENTS; DIPOLE ILLUMINATION; EDGE LENGTH; EXPOSURE TOOLS; FAR FIELDS; FREE-FORM SURFACES; HIGH NUMERICAL APERTURES; HIGH PRECISION; HIGH TRANSMISSION; HYPER-NA; IDEAL SOLUTIONS; ILLUMINATION OPTICS; INTENSITY DISTRIBUTIONS; INTENSITY RATIOS; MASK STRUCTURES; MICRO-OPTICAL ELEMENTS (MOE); MICRO-OPTICS; MONOLITHIC ARRAYS; MULTIPOLE; NUMERICAL APERTURE (NA); OFF-AXIS-ILLUMINATION (OAI); OPTICAL ELEMENTS; OPTICAL LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; POLARIZATION CONTROL; PRINTING RESOLUTION; PRODUCTION TECHNOLOGIES; QUADRUPOLE; REFRACTIVE OPTICS; REPRODUCIBILITY;

FUSED SILICA;

EID: 45449088897     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771213     Document Type: Conference Paper

References (6)

1. Levinson, H. J., [Principles of Lithography], SPIE Press, 133 (2001)
2. Mack, C. A., [Optical Lithography], SPIE Press, Bellingham & Washington, Sect.2 (2006)
3. Bizjak, T., Mitra, T., Aschke, L., "Novel high-throughput micro-optical beam shapers reduce the complexity of macro-optics in hyper-NA illumination systems", Proc. SPIE 6520, 65202X1-X11 (2007)
4. Bizjak, T., Homburg, O., Aschke, L., Lissotschenko, V., "Refractive Homogenizers enable Hyper-NA Illumination Systems for Immersion Lithography", 3nd International Symposium on Immersion Lithography, Kyoto (2006)
5. Brown, D.M., Dickey, F.M., Weichmann, L.S., "Multi-aperture Beam Integration Systems", [Laser Beam Shaping], Theory and Techniques], Dickey, F.M., Holswade, S.C. (ed), 273-311 (2000)
6. H. Ganser, M. Darscht, Y. Miklyaev, D. Hauschild, L. Aschke, "High-throughput homogenizers for hyper-NA illumination systems" Proc. SPIE 6154, 61542N1-N11 (2006)