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Volumn 6924, Issue , 2008, Pages

A new OPC method for double patterning technology

Author keywords

Ad OPC; Decomposition; Double patterning; Optical proximity correction; Re cut; Reuse; Segment move

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CONTROL THEORY; DECOMPOSITION; ELECTRON BEAM LITHOGRAPHY; MATHEMATICAL MODELS; MULTITASKING; PHOTOLITHOGRAPHY; RHENIUM; ROBUST CONTROL; TECHNOLOGY; TITRATION;

EID: 45449087528     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772345     Document Type: Conference Paper
Times cited : (2)

References (8)
  • 1
    • 35148837660 scopus 로고    scopus 로고
    • Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using Relacs shrink and corresponding OPC
    • M.Op de Beeck, et al., "Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using Relacs shrink and corresponding OPC", Proceedings of SPIE, vol. 6520, (2007).
    • (2007) Proceedings of SPIE , vol.6520
    • de Beeck, M.O.1
  • 2
    • 36248934627 scopus 로고    scopus 로고
    • Approach to Analyze Decomposition Impact for Photomask Fabrication
    • Nobuhito Toyama, et al., "Approach to Analyze Decomposition Impact for Photomask Fabrication", Proceedings of SPIE, vol. 6607, (2007).
    • (2007) Proceedings of SPIE , vol.6607
    • Toyama, N.1
  • 3
    • 33846591914 scopus 로고    scopus 로고
    • Application Challenges with Double Patterning Technology (DPT) beyond 45nm
    • J. Park, et al, "Application Challenges with Double Patterning Technology (DPT) beyond 45nm", Proc. of SPIE, Vol.6349, (2006).
    • (2006) Proc. of SPIE , vol.6349
    • Park, J.1
  • 4
    • 35148840123 scopus 로고    scopus 로고
    • Double Patterning Design Split Implementation and Validation for the 32nm Node
    • Martin Drapeau, et al., "Double Patterning Design Split Implementation and Validation for the 32nm Node", SPIE Vol.6521,(2007)
    • (2007) SPIE , vol.6521
    • Drapeau, M.1
  • 5
    • 35148841978 scopus 로고    scopus 로고
    • Double pattern EDA solution for 32nm HP and beyond
    • George E.Bailey, et al., "Double pattern EDA solution for 32nm HP and beyond", Proceedings of SPIE, Vol.6521,(2007)
    • (2007) Proceedings of SPIE , vol.6521
    • Bailey, G.E.1
  • 6
    • 33745777382 scopus 로고    scopus 로고
    • Positive and Negative Tone Double Patterning Lithography For 50nm Flash
    • SPIE
    • Chang-Moon Lim, et al., "Positive and Negative Tone Double Patterning Lithography For 50nm Flash Memory", SPIE Vol.6154, (2006).
    • (2006) Memory , vol.6154
    • Lim, C.-M.1
  • 7
    • 35148822268 scopus 로고    scopus 로고
    • SOFT: Smooth OPC fixing technique for ECO process
    • Hongbo Zhang, Zheng Shi, "SOFT: smooth OPC fixing technique for ECO process", Proc. SPIE Vol. 6521, (2007).
    • (2007) Proc. SPIE , vol.6521
    • Zhang, H.1    Shi, Z.2
  • 8
    • 25144518635 scopus 로고    scopus 로고
    • Exploiting hierarchical structure to enhance cell-based RET with localized OPC reconfiguration
    • Xin Wang, Mark Pilloff, Hongbo Tang and Clive Wu, "Exploiting hierarchical structure to enhance cell-based RET with localized OPC reconfiguration", SPIE Vol.5756, (2005).
    • (2005) SPIE , vol.5756
    • Wang, X.1    Pilloff, M.2    Tang, H.3    Wu, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.