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Volumn 6924, Issue , 2008, Pages
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A new OPC method for double patterning technology
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Author keywords
Ad OPC; Decomposition; Double patterning; Optical proximity correction; Re cut; Reuse; Segment move
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Indexed keywords
CADMIUM;
CADMIUM COMPOUNDS;
COMPUTER NETWORKS;
CONTROL THEORY;
DECOMPOSITION;
ELECTRON BEAM LITHOGRAPHY;
MATHEMATICAL MODELS;
MULTITASKING;
PHOTOLITHOGRAPHY;
RHENIUM;
ROBUST CONTROL;
TECHNOLOGY;
TITRATION;
(ALGORITHMIC) COMPLEXITY;
(E ,3E) PROCESS;
CD UNIFORMITY (CDU);
CONVERGENCE (MATHEMATICS);
DATA VOLUMES;
DEEP SUB-MICRON (DSM);
DOUBLE PATTERNING;
EDGE PLACEMENT ERROR (EPE);
MANUFACTURABILITY;
NEW MODEL;
OPTICAL MICRO LITHOGRAPHY;
OPTICAL PROXIMITY CORRECTION (OPC);
OVERLAP CORRECTION;
OVERLAY CONTROL;
PATTERN CORRECTION;
PRINTING PROBLEMS;
RUN TIME;
SPEED UPS;
STITCHING TECHNOLOGY;
VLSI TECHNOLOGIES;
CONVERGENCE OF NUMERICAL METHODS;
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EID: 45449087528
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.772345 Document Type: Conference Paper |
Times cited : (2)
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References (8)
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