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Volumn , Issue , 2004, Pages 237-240

The use of unified APC/FD in the control of a metal etch area

Author keywords

Advanced Process Control (APC); Fault Detection (FD); Neural Networks; Process capability (C pk)

Indexed keywords

ADVANCED PROCESS CONTROL )APC); DYNAMIC NEURAL CONTROLLER (DNC); FAULT DETECTION (FD); PROCESS CAPABILITY;

EID: 4544348626     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (7)
  • 1
    • 0032116428 scopus 로고    scopus 로고
    • Run-to-run process control of a plasma etch process with neural network modeling
    • Card J.P., Naimo M., and Ziminsky M., "Run-to-Run Process Control of a Plasma Etch Process with Neural Network Modeling," Quality and Reliability Engineering International 14, no. 4: 247-260, (1998).
    • (1998) Quality and Reliability Engineering International , vol.14 , Issue.4 , pp. 247-260
    • Card, J.P.1    Naimo, M.2    Ziminsky, M.3
  • 2
    • 33748102643 scopus 로고    scopus 로고
    • Using neural networks for intelligent plasma etch process control
    • Card, J. and Laurin, L., "Using Neural Networks for Intelligent Plasma Etch Process Control," Solid State Technology 45, no. 11: 33-36, (2002).
    • (2002) Solid State Technology , vol.45 , Issue.11 , pp. 33-36
    • Card, J.1    Laurin, L.2
  • 3
    • 0038165685 scopus 로고    scopus 로고
    • Intelligent metrology and control systems applied to lithography processes: Case study: Lithography overlay run-to-run control
    • Snowbird, UT
    • Cheng C.H. and Moyne J., "Intelligent Metrology and Control Systems Applied to Lithography Processes: Case Study: Lithography Overlay Run-to-Run Control", 14th AEC/APC Symposium Snowbird, UT,(2002).
    • (2002) 14th AEC/APC Symposium
    • Cheng, C.H.1    Moyne, J.2
  • 4
    • 0038504271 scopus 로고    scopus 로고
    • Analysis of a run-to-run controller on a drifting STI etch process by augmentation of the integrated interferometric endpoint detection system
    • Snowbird, UT
    • R. Chong et al., "Analysis of a Run-to-Run Controller on a Drifting STI Etch Process by Augmentation of the Integrated Interferometric Endpoint Detection System", 14th AEC/APC Symposium Snowbird, UT,(2002).
    • (2002) 14th AEC/APC Symposium
    • Chong, R.1
  • 5
    • 0032288356 scopus 로고    scopus 로고
    • Monitoring and control of semiconductor manufacturing processes
    • Limanond S., Si J., and Tsakalis K., "Monitoring and Control of Semiconductor Manufacturing Processes," IEEE Control Systems Magazine 18, no. 6: 46-58, (1998).
    • (1998) IEEE Control Systems Magazine , vol.18 , Issue.6 , pp. 46-58
    • Limanond, S.1    Si, J.2    Tsakalis, K.3
  • 6
    • 33646206692 scopus 로고    scopus 로고
    • Dynamic neural controller: Test results for LAM plasma etch applications
    • Banff, Canada
    • Card J, Chan W., Eills M et. al, Dynamic neural controller: test results for LAM plasma etch applications, 13th AEC/APC Symposium Banff, Canada (2001)
    • (2001) 13th AEC/APC Symposium
    • Card, J.1    Chan, W.2    Eills, M.3
  • 7
    • 0038606842 scopus 로고    scopus 로고
    • Using maintenance input data to increase the prediction accuracy of APC strategies
    • July
    • Cao A., Card J. and Chan W., Using maintenance input data to increase the prediction accuracy of APC strategies, Micro, July, (2003)
    • (2003) Micro
    • Cao, A.1    Card, J.2    Chan, W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.