Run-to-run process control of a plasma etch process with neural network modelling

Quality and Reliability Engineering International

Volumn 14, Issue 4, 1998, Pages 247-260

  Card, Jill P ^a   Naimo, Mark ^a   Ziminsky, William ^a  

^a Digital Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CORRELATION METHODS; FEEDBACK CONTROL; GENETIC ALGORITHMS; HEURISTIC METHODS; NEURAL NETWORKS; NONLINEAR CONTROL SYSTEMS; OPTIMIZATION; PROCESS CONTROL; PROCESS ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

RUN-TO-RUN PROCESS CONTROL;

PLASMA ETCHING;

EID: 0032116428     PISSN: 07488017     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-1638(199807/08)14:4<247::AID-QRE188>3.0.CO;2-V     Document Type: Article

References (27)