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Volumn 45, Issue 2, 2004, Pages 540-549

Monte Carlo electron beam lithography simulation of sub-0.1-μm T-gate process for millimeter-wave HEMTs considering 50-kV and 100-kV electron beam exposure systems

(4) Son, Myung Sik a Rhee, Jin Koo a Lee, Jun Ha b Hwang, Ho Jung c

a Dongguk University (South Korea)

b Sangmyung University (South Korea)

c Chung Ang University (South Korea)

Author keywords

Electron beam lithography; GaAs; HEMT; InP; Millimeter wave; Monte Carlo simulation; T gate

Indexed keywords

EID: 4544310847 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (4)

References (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.