Study of magnetic field assisted mechanochemical polishing process for inner surface of Si3N4 ceramic components finishing characteristics under wet finishing using distilled water

International Journal of Machine Tools and Manufacture

Volumn 44, Issue 14, 2004, Pages 1547-1553

  Wang, Debin ^a   Shinmura, Takeo ^b   Yamaguchi, Hitomi ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY LIAONING   (China)

^b UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

Chromium oxide abrasive; Distilled water; Internal finishing; Magnetic field assisted finishing; Material removal; Mechanochemical polishing; Silicon nitride ceramics; Surface roughness

Indexed keywords

CERAMIC MATERIALS; CHEMICAL POLISHING; CHROMIUM COMPOUNDS; FRACTURE TOUGHNESS; MAGNETIC FLUX; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; WEAR RESISTANCE;

CHROMIUM-OXIDE ABRASIVE; INTERNAL FINISHING; MATERIAL REMOVAL; MECHANOCHEMICAL POLISHING;

SILICON NITRIDE;

EID: 4544294619     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2004.04.024     Document Type: Article

References (8)

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