Magnetic field assisted mechanochemical polishing process for inner surface of silicon nitride ceramic components

Nippon Kikai Gakkai Ronbunshu, C Hen/Transactions of the Japan Society of Mechanical Engineers, Part C

Volumn 68, Issue 9, 2002, Pages 2770-2776

  Wang, Debin ^a   Yamaguchi, Hitomi ^a   Shinmura, Takeo ^a  

^a UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

Abrasive grain; Internal finishing; Magnetic field assisted finishing; Mechanochemical polishing; Non traditional machining; Polishing; Silicon nitride ceramics; Surface roughness

Indexed keywords

ABRASIVES; CERAMIC MATERIALS; CHROMIUM COMPOUNDS; MAGNETIC FIELDS; SILICON NITRIDE; SURFACE ROUGHNESS;

ABRASIVE GRAIN; CERAMIC TUBES; INTERNAL FINISHING;

CHEMICAL MECHANICAL POLISHING;

EID: 0036764422     PISSN: 03875024     EISSN: None     Source Type: Journal    
DOI: 10.1299/kikaic.68.2770     Document Type: Article

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