Increase in indium diffusion by tetrafluoromethane plasma treatment and its effects on the device performance of polymer light-emitting diodes

Journal of Applied Physics

Volumn 103, Issue 11, 2008, Pages

  Jo, Sung Jin ^a   Kim, Chang Su ^a   Kim, Jong Bok ^a   Ryu, Seung Yoon ^a   Noh, Joo Hyon ^a   Baik, Hong Koo ^a   Kim, Youn Sang ^b   Lee, Se Jong ^c  

^a Yonsei University   (South Korea)

^b Ewha Womans University   (South Korea)

^c Kyungsung University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT EMITTING DIODES; PLASMA APPLICATIONS; PLASMA DIODES;

DEVICE PERFORMANCES; INDIUM DIFFUSION; PLASMA TREATMENTS; POLYMER LIGHT-EMITTING DIODE (PLED);

PHOTOACOUSTIC EFFECT;

EID: 45149130917     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2939261     Document Type: Article

References (20)

1. J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackey, R. H. Friend, P. L. Burn, and A. B. Holmes, Nature (London) NATUAS 0028-0836 10.1038/347539a0 347, 539 (1990).
2. D. Braun and A. J. Heeger, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.105039 58, 1982 (1991).
3. C. C. Wu, C. I. Wu, J. C. Sturm, and A. Kahn, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.118575 70, 1348 (1997).
4. I. Chan and C. Hong, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(03)01197-0 444, 254 (2003).
5. S. K. So, W. K. Choi, C. H. Cheng, L. M. Leung, and C. F. Kwong, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s003390050921 68, 447 (1999).
6. F. Nuesch, L. J. Rothberg, E. W. Forsythe, Q. T. Le, and Y. Gao, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.123397 74, 880 (1999).
7. R. A. Hatton, S. R. Day, M. A. Chesters, and M. R. Willis, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(01)01191-9 394, 291 (2001).
8. S. A. van Slyke, C. H. Chen, and C. W. Tang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.117151 69, 2160 (1996).
9. J. Shi and C. W. Tang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.118664 70, 1665 (1997).
10. S. A. Carter, J. C. Scott, and P. J. Brock, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.119848 71, 1145 (1997).
11. A. R. Schlatmann, D. Wilms Floet, A. Hilberer, F. Garten, P. J. M. Smulders, T. M. Klapwijk, and G. Hadziioannou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.117478 69, 1764 (1996).
12. L. Ke, R. S. Kumar, K. Zhang, S. J. Chua, and A. T. S. Wee, Synth. Met. SYMEDZ 0379-6779 140, 295 (2004).
13. D. R. Lide, CRC Handbook of Chemistry and Physics, 80th ed. (CRC, Boca Raton, FL, 2000).
14. I. D. Parker, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.356350 75, 1656 (1994).
15. S. J. Jo, S. M. Jeong, W. J. Kim, W. H. Koo, S. H. Choi, C. S. Kim, S. J. Lee, and H. K. Baik, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1953707 23, 1367 (2005).
16. M. P. de Jong, L. J. van IJzendoorn, and M. J. A. de Voigt, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1315344 77, 2255 (2000).
17. K. W. Wong, H. L. Yip, Y. Luo, K. Y. Wong, W. M. Lau, K. H. Low, H. F. Chow, Z. Q. Gao, W. L. Yeung, and C. C. Chang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1469220 80, 2788 (2002).
18. S. J. Jo, C. S. Kim, S. Y. Ryu, J. B. Kim, J. H. Noh, S. J. Lee, and H. K. Baik, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 46, 6814 (2007).
19. S. T. Lee, Z. Q. Gao, and L. S. Hung, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.124708 75, 1404 (1999).
20. C. Chang and S. Chen, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2759474 91, 103514 (2007).