Stress and magnetoelastic properties control of amorphous Fe 80B20 thin films during sputtering deposition

Journal of Applied Physics

Volumn 103, Issue 11, 2008, Pages

  Fernandez Martinez I ^a   Costa Kramer J L ^a   Briones, F ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

IRON; STRESSES;

(ABIOTIC AND BIOTIC) STRESS; IN SITU STRESS MEASUREMENTS; MAGNETOELASTIC PROPERTIES; SPUTTERING DEPOSITION;

SPUTTER DEPOSITION;

EID: 45149099614     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2931043     Document Type: Article

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