Ultrafast laser fabrication of submicrometer pores in borosilicate glass

Optics Letters

Volumn 33, Issue 10, 2008, Pages 1153-1155

  An, Ran ^a   Uram, Jeffrey D ^a   Yusko, Erik C ^a   Ke, Vin ^a   Mayer, Michael ^a   Hunt, Alan J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; FABRICATION; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ULTRAFAST LASERS;

FEMTOSECOND LASER MACHINING; HIGH QUALITY; LASER FABRICATION; PORE DIAMETERS; PULSE ANALYSIS; RAPID FABRICATION; SUBMICROMETERS; WET ETCH TECHNIQUES;

BOROSILICATE GLASS;

GLASS; NANOMATERIAL;

ARTICLE; LASER; NANOTECHNOLOGY; SURFACE PROPERTY;

GLASS; LASERS; NANOSTRUCTURES; NANOTECHNOLOGY; SURFACE PROPERTIES;

EID: 44949143000     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.33.001153     Document Type: Article

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