Advanced metrologies for wafer contamination and nanolayer characterization using XRF methods

ECS Transactions

Volumn 11, Issue 3, 2007, Pages 273-279

  Beckhoff, B ^a   Fliegauf, R ^a   Honicke P ^a   Kolbe, M ^a   Muller M ^a   Pollakowski, B ^a   Weser, J ^a   Ulm, G ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILING; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SYNCHROTRON RADIATION; SYNCHROTRONS;

ANALYTICAL METHOD; CONTAMINATION ANALYSIS; ELEMENTAL DEPTH PROFILING; GRAZING INCIDENCE; SEMI-CONDUCTOR SURFACES; TOTAL REFLECTION; WAFER CONTAMINATION; X RAY FLUORESCENCE;

CONTAMINATION;

EID: 44949131495     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2778670     Document Type: Conference Paper

References (5)

1. B. Beckhoff, R. Fliegauf, G. Ulm, J. Weser, G. Pepponi, C. Streli, P. Wobrauschek, T. Ehmann, L. Fabry, C. Mantler, S. Pahlke, B. Kanngießer, W. Malzer, Electrochem. Soc. Proc. 2003-03, 120, 2003.
2. C. Streli, P. Wobrauschek, L. Fabry, S. Pahlke, F. Comin, R. Barett, P. Pianetta, K. Lüning, B. Beckhoff, 'Total-Reflection X-Ray Fluorescence (TXRF) Wafer Analysis', Handbook of Practical X-Ray Fluorescence Analysis [B. Beckhoff, B. Kanngießer, N. Langhoff, R. Wedell, H. Wolff (Eds.)], Springer, 2006.
3. G. Pepponi, B. Beckhoff, T. Ehmann, G. Ulm, C. Streli, L. Fabry, S. Pahlke, P. Wobrauschek, Spectrochim. Acta B 58, 2245, 2003.
4. S. Török, J. Osan, B. Beckhoff, G. Ulm, Powder Diffraction J. 19, 81, 2004.
5. M. Kolbe, B. Beckhoff, M. Krumrey, G. Ulm, Spectrochim. Acta B 60, 505, 2005.