Impact of well edge proximity effect on timing

ESSCIRC 2007 - Proceedings of the 33rd European Solid-State Circuits Conference

Volumn , Issue , 2007, Pages 115-118

  Kanamoto, Toshiki ^a   Ogasahara, Yasuhiro ^b   Natsume, Keiko ^a   Yamaguchi, Kenji ^a   Amishiro, Hiroyuki ^a   Watanabe, Tetsuya ^a   Hashimoto, Masanori ^b  

^a RENESAS TECHNOLOGY CORP   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER NETWORKS; DIGITAL INTEGRATED CIRCUITS; ELECTRIC POTENTIAL; MODEL STRUCTURES; NANOTECHNOLOGY; NETWORKS (CIRCUITS); PHOTOACOUSTIC EFFECT; TECHNOLOGY; THRESHOLD VOLTAGE;

(E ,3E) PROCESS; 65NM TECHNOLOGY; CIRCUIT DELAYS; EUROPEAN; EXPERIMENTAL RESULTS; MODEL PARAMETERS; PROXIMITY EFFECTS; SOLID-STATE CIRCUITS CONFERENCE; TEST STRUCTURES;

TIMING CIRCUITS;

EID: 44849089686     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSCIRC.2007.4430259     Document Type: Conference Paper

References (10)

1. T.B.Hook, J.Brown, P.Cottrell, E.Adler, D.Hoyniak, J.Johnson, R.Mann, "Lateral ion implant straggle and mask proximity effect", IEEE Transactions on Electron Devices, vol.50, Issue 9, pp. 1946-1951, Sept. 2003.
2. I.Polishchuk, N.Mathur, C.Sandstrom, P.Manos, O.Pohland, "CMOS Vt-control improvement through implant lateral scatter elimination", Proceedings of the IEEE International Symposium on Semiconductor Manufacturing 2005, pp. 193 - 196, Sept. 2005.
3. Yi-Ming Sheu, Ke-Wei Su, Sheng-Jier Yang, Hsien-Te Chen, Chih-Chiang Wang, Ming-Jer Chen, S.Liu, "Modeling well edge proximity effect on highly-scaled MOSFETs", Proceedings of the IEEE Custom Integrated Circuits Conference 2005, pp. 831 - 834, Sept. 2005.
4. Yiqian Zhang, Qiang Zhou, Xianlong Hong,Yici Cai, "Path-based timing optimization by buffer insertion with accurate delay model", Proceedings of 5th International Conference on ASIC, vol.1, pp. 89-92, Oct. 2003.
5. "BSIM4.5.0 Complete Manual," University of California, Berkeley, July 2005.
6. "Guidelines for Extracting Well Proximity Effect Instance Parameters", Compact Modeling Council, http://www.eigroup.org/CMC/proximity
7. J.Watts, K.Su, M.Basel, "Netlisting and Modeling Well-Proximity Effects", IEEE Transactions on Electron Devices, vol.53, Issue 9, pp.2179-2186, Sept. 2006.
8. The International Technology Roadmap for Semiconductors, 2005 Edition.
9. "Library Compiler Version 2000.05 User Guide," Synopsys inc.
10. H. Onodera, "Variability: Modeling and Its Impact on Design," IEICE Transactions on Electronics, Vol. E89-C, No. 3, pp. 342-348, March 2006.