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Volumn 266, Issue 12-13, 2008, Pages 2958-2961

Channeling irradiation of LiNbO3

Author keywords

Channeling; Chemical etching; Ion implantation; LiNbO3; Lithium niobate; Radiation damage

Indexed keywords

CRYSTALLOGRAPHY; ELECTROCHEMICAL ETCHING; ION IMPLANTATION; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS;

EID: 44649152247     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.03.147     Document Type: Article
Times cited : (5)

References (13)
  • 2
    • 44649111413 scopus 로고    scopus 로고
    • F. Schrempel, Th. Gischkat, H. Hartung, E.-B. Kley, W. Wesch, A. Tünnermann, Mater. Res. Soc. Symp. Proc. 0908-OO16-01.1, 2005.
    • F. Schrempel, Th. Gischkat, H. Hartung, E.-B. Kley, W. Wesch, A. Tünnermann, Mater. Res. Soc. Symp. Proc. 0908-OO16-01.1, 2005.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.