Investigation of device parameters for field-effect DNA-sensors by three-dimensional simulation

2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

Volumn 1, Issue , 2006, Pages 154-155

  Howell, Eddie ^a   Heitzinger, Clemens ^b   Klimeck, Gerhard ^b  

^a NORFOLK STATE UNIVERSITY   (United States)

^b PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 44649137266     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NMDC.2006.4388725     Document Type: Conference Paper

References (7)

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2. J. Hahm and C. M. Lieber, "Direct Ultrasensitive Electrical Detection of DNA and DNA Sequence Variations Using Nanowire Nanosensors," Nano Letters, vol. 4, no. 1, pp. 51-54, 2004.
3. th Int. Workshop Comput. Electron. (IWCE 11), Vienna, Austria, May 2006.
4. C. Heitzinger and G. Klimeck, "Computational Aspects of the Three-Dimensional Feature-Scale Simulation of Silicon-Nanowire Field-Effect Sensors for DNA Detection," J. Comp. El., 2006. Submitted for publication.
5. J. Wang, E. Polizzi, and M. Lundstrom, "A three-dimensional quantum simulation of silicon nanowire transistors with the effective-mass approximation," J. Appl. Phys., vol. 96, no. 4, pp. 2192-2203, 2004.
6. S. Selberherr et al., MiniMOS 6.1 User's Guide, Institute for Microelectronics, Technical University, 1999.
7. A. W. Peterson, R. J. Heaton, and R. M. Georgiadis, "The effect of surface probe density on DNA hybridization," Nucleic Acids Research, vol. 29, no. 24, pp. 5163-5168, 2001.