Low temperature growth of manganese cobalt nickelate films by chemical deposition

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 5931-5934

  Ge, Yujian ^a   Huang, Zhiming ^a   Hou, Yun ^a   Qin, Jianhuan ^a   Li, Tianxin ^a   Chu, Junhao ^a  

^a SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

Atomic force microscopy; Infrared spectroscopic ellipsometry; Manganese cobalt nickelate film; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT COMPOUNDS; CRYSTALLIZATION; DEPOSITION; SINTERING; X RAY DIFFRACTION;

INFRARED SPECTROSCOPIC ELLIPSOMETRY; LOW TEMPERATURE GROWTH; MANGANESE COBALT NICKELATE FILMS; SINTERING TEMPERATURE;

THIN FILMS;

EID: 44649110180     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.059     Document Type: Article

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