Electrochemical deposition of ZnSe from dimethyl sulfoxide solution and characterization of epitaxial growth

Journal of Physical Chemistry B

Volumn 108, Issue 35, 2004, Pages 13191-13199

  Henriquez R ^a,b   Gomez H ^b   Riveros, G ^b   Guillemoles, J F ^a   Froment, M ^c   Lincot, D ^a  

^a PSL RESEARCH UNIVERSITY   (France)

^b PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^c SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CODEPOSITION; CRYSTALLINE PLANES; CRYSTALLINE SEMICONDUCTORS; FILM FORMATION;

ATOMIC FORCE MICROSCOPY; ELECTRODEPOSITION; ELECTRON SPECTROSCOPY; EPITAXIAL GROWTH; PARAMETER ESTIMATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY;

ZINC COMPOUNDS;

EID: 4444380459     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0486191     Document Type: Article

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