The photoelectron diffraction technique applied to advanced materials

Journal of Physics Condensed Matter

Volumn 16, Issue 33, 2004, Pages

  Tejeda, Antonio ^a,b   Michel, Enrique G ^a  

^a INSTITUTO NICOLÁS CABRERA   (Spain)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC STRUCTURE; CHEMICAL SENSITIVITY; PHOTOELECTRON DIFFRACTION;

CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DIFFRACTION; PHOTOEMISSION; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

PHOTOELECTRICITY;

EID: 4444296405     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/16/33/004     Document Type: Conference Paper

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