Comparison of visible photoluminescence from Si ion-irradiated SiO 2/Si/SiO2 films fabricated by ion beam sputtering deposition and electron beam evaporation

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 176-181

  Kim, H B ^a   Son, J H ^a   Whang, C N ^a   Chae, K H ^b  

^a Yonsei University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Ion irradiation; Nanocrystals; Photoluminescence; Silicon

Indexed keywords

ELECTRON BEAM EVAPORATION; ION-IRRADIATED FILMS; RADIATIVE DEFECTS;

ELECTRON BEAMS; EVAPORATION; ION BEAMS; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; PARAMAGNETIC RESONANCE; PHOTOLUMINESCENCE; SILICA; SPUTTER DEPOSITION;

THIN FILMS;

EID: 4444247570     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.03.033     Document Type: Article

References (15)

1. Bettotti P., Cazzanelli M., Dal Negro L., Danese B., Oton C.J., Vijaya G., Pavesi L. J. Phys., Comdens. Matter. 14:2002;8253.
2. Shimizu-Iwayama T., Fuhita K., Nakao S., Saitoh K., Fujita T., Itoh N. J. Appl. Phys. 75:1994;7779.
3. Mutti P., Ghislotti G., Bertoni S., Bonoldi L., Cerofolini G.F., Meda L., Grilli E., Guzzi M. Appl. Phys. Lett. 66:1995;851.
4. Skorupa W., Yankov R.A., Tyschenko I.E., Frob H., Bohme T., Leo K. Appl. Phys. Lett. 68:1996;2410.
5. Guha S., Pace M.D., Dunn D.N., Singer I.L. Appl. Phys. Lett. 70:1997;1207.
6. Chae K.H., Son J.H., Chang G.S., Kim H.B., Jeong J.Y., Im S., Song J.H., Kim K.J., Kim H.K., Whang C.N. Nanostruct. Mater. 11:1999;1239.
7. Kim H.B., Son J.H., Whang C.N., Chae K.H., Lee W.S., Im S., Kim S.O., Woo J.J., Song J.H. J. Korean Phys. Soc. 37:2000;466.
8. Son J.H., Kim T.G., Shin S.W., Kim H.B., Lee W.S., Im S., Song J.H., Whang C.N., Chae K.H. Opt. Mater. 17:2001;125.
9. Efros A.I.L., Efros A.L. Sov. Phys., Semicond. 16:1982;772.
10. Trwoga P.F., Kenyon A.J., Pitt C.W. J. Appl. Phys. 83:1998;3789.
11. Liao L.S., Bao X.M., Zheng X.Q., Li N.S., Min N.B. Appl. Phys. Lett. 68:1996;850.
12. Jeong J.Y., Im S., Oh M.S., Kim H.B., Chae K.H., Whang C.N., Song J.H. J. Lumin. 80:1999;285.
13. Stesmans A., Braet J., Witters J., Dekerrsmaecker R.F. Surf. Sci. 141:1984;255.
14. Warren W.L., Poindexter E.H., Offenberg M., Muller-Warmuth W. J. Electrochem. Soc. 139:1992;872.
15. Ziegler J.F., Biersack J.P., Littmark U. The Stopping and Range of Ions in Solids. vol. 1:1985;Pergamon, New York.