A study of the factors influencing the kinetics in Ag/Al bilayer systems

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 267-274

  Malgas, Gerald F ^a   Adams, Daniel ^a,b   Alford, T L ^b   Mayer, J W ^b  

^a UNIVERSITY OF THE WESTERN CAPE   (South Africa)

^b Arizona State University   (United States)

Author keywords

Activation energies; Al diffusion; Al oxide passivation; Kinetics; Silver metallization

Indexed keywords

ALUMINIUM OXIDES; BILAYER SYSTEMS; RUTHERFORD BACKSCATTERING SPECTROMETRY (RBS); SILVER METALLIZATION;

ACTIVATION ENERGY; BACKSCATTERING; COMPUTER SIMULATION; DIFFUSION; METALLIZING; PRESSURE EFFECTS; REACTION KINETICS; SILICA; SILICON WAFERS; SILVER; SUBSTRATES; THERMAL EFFECTS;

THIN FILMS;

EID: 4444223913     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.025     Document Type: Article

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