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Volumn 86, Issue 2, 2008, Pages 87-91
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Mass transfer considerations during pulse plating
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Author keywords
Dual diffusion layer; Mass transfer; Pulse current; Pulse deposition; Pulse limiting current; Pulse parameters; Pulse plating
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Indexed keywords
ELECTRIC CURRENTS;
PARAMETER ESTIMATION;
PLATING;
PULSE LIMITING CURRENT;
PULSE PARAMETERS;
PULSE PLATING;
DIFFUSION;
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EID: 44349162859
PISSN: 00202967
EISSN: None
Source Type: Journal
DOI: 10.1179/174591908X272942 Document Type: Article |
Times cited : (19)
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References (15)
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