PMMA-based resists for a spectral range near 13 nm

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 448, Issue 1, 2000, Pages 487-492

  Bulgakova, S A ^a   Lopatin, A Ya ^b   Luchin, V I ^b   Mazanova, L M ^a   Molodnjakov, S A ^b   Salashchenko, N N ^b  

^a LOBACHEVSKY STATE UNIVERSITY OF NIZHNY NOVGOROD   (Russian Federation)

^b INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; COPOLYMERS; LASER PRODUCED PLASMAS; PLASMA SOURCES; POLYMETHYL METHACRYLATES; RADIATION EFFECTS; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL); X RAY LASERS;

COMONOMERS; ISOPROPYL ALCOHOL; LASER PLASMA SOURCE; METHYLETHYLKETONE; RESIST FILM; SOFT X RAY RADIATION;

PHOTORESISTS;

EID: 0034205999     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(00)00237-0     Document Type: Article

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