Microstructure, porosity and roughness of RF sputtered oxide thin films: Characterization and modelization

Applied Surface Science

Volumn 254, Issue 18, 2008, Pages 5796-5802

  Oudrhiri Hassani, Fahd ^a   Presmanes, Lionel ^a   Barnabé, Antoine ^a   Tailhades, Philippe ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

Ellipsometry; Microstructure; Spinel oxide; Sputtering; Surface enhancement factor; Thin films

Indexed keywords

ELLIPSOMETRY; MICROSTRUCTURE; POROSITY; SPUTTERING; SURFACE ROUGHNESS;

GAS ADSORPTION TECHNIQUES; SPINEL OXIDE; SURFACE ENHANCEMENT FACTOR; TARGET-SUBSTRATE DISTANCE;

OXIDE FILMS;

EID: 44349110051     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.149     Document Type: Article

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