Effects of ion implantation on the microstructure and residual stress of filter arc CrN films

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5330-5333

  Weng, Ko Wei ^a   Chen, Ya Chi ^b   Han, Sheng ^c   Hsu, Chih Sheng ^a   Chen, Yung Lin ^a   Wang, Da Yung ^a  

^a MINGDAO UNIVERSITY   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Glancing incident X ray diffraction; Hybrid PVD; Metal plasma ion implantation; Wear resistance

Indexed keywords

CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; HARDNESS; ION IMPLANTATION; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS;

FILTER ARC DEPOSITION (FAD); HYBRID PHYSICAL VAPOR DEPOSITION; METAL PLASMA ION IMPLANTATION SOURCE (MPII); POLE FIGURE ANALYSES;

THIN FILMS;

EID: 43949107875     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.088     Document Type: Article

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