AFM applications to the study of thin films morphology: A power spectral density approach

Proceedings of the International Semiconductor Conference, CAS

Volumn 1, Issue , 2006, Pages 167-170

  Gavrila, R ^a   Dinescu, A ^a   Mardare, D ^b  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

^b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; POWER SPECTRAL DENSITY; TITANIUM DIOXIDE;

CHARACTERISTIC PARAMETERS; SPATIAL FREQUENCIES;

THIN FILMS;

EID: 43549098747     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMICND.2006.283959     Document Type: Conference Paper

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