New method to reduce alignment error caused by optical system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 849-860

  Nagayama, Tadashi ^a   Nakajima, Shinichi ^a   Sugaya, Ayako ^a   Kanaya, Yuho ^a   Sukegawa, Ayako ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Alignment; Image processing; Imaging system; Optical system; Stepper

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; OPTICAL INSTRUMENT LENSES; OPTIMIZATION;

FIELD IMAGE ALIGNMENT; SPATIAL FREQUENCY ANALYSIS;

OPTICAL SYSTEMS;

EID: 0141611930     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483513     Document Type: Conference Paper

References (3)

1. M. Born and E. Wolf, Principle of Optics, 5th edition, Pergamon Press, Oxford, (1975)
2. E. Hecht, Optics, 3rd edition, p512-523, Addition Wesley, (1998)
3. A. Sugaya et al, "Innovative Optical Alignment Technique for CMP Wafers", Proc Spie, Vol4691, pp954(2002)